Résumé
Summary of contents
- Clean room technology
- wafer cleaning technology
- epitaxy
- conventional and rapid thermal process
- dielectric and polysilicon film deposition
- lithography
- etching
- metallization
- process integration
- assembly and packaging
- yield and manufacture technology
- reliability
L'auteur - Simon M. Sze
Simon M. Sze, Ph.D. is UMC Chair Professor of National
Chiao Tung University, and President of the National Nano
Device Laboratories. He has received the IEEE Ebers Award,
the Sun Yet-sen Award, the National Science and Technology
Award, and the National Chair Professor Award. He is a Life
Fellow of IEEE, a member of the Academia Sinica, the
Chinese Academy of Engineering, and the US National Academy
of Engineering. He has authored or coauthored over 150
technical papers, and has written, edited, and contributed
to 24 books. His book Physics of Semiconductor Devices
(Wiley 1969, 2nd Ed, 1981) is the most cited work in
contemporary engineering and applied science publications
(over 12,000 citations from ISI Press).
Caractéristiques techniques
PAPIER | |
Éditeur(s) | Mc Graw Hill |
Auteur(s) | C.Y. Chang, Simon M. Sze |
Parution | 01/05/1996 |
Nb. de pages | 640 |
EAN13 | 9780071141055 |
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